Developer

Parameter Table

Product Description

In integrated circuit and display panel manufacturing, "development" often refers to the step in the photolithography process used to remove photoresist from unexposed areas. This step is critical in the manufacturing process because it defines the pattern and structure of the material, which affects the functional performance of the device. In the photolithography process, a developing solution is used to process the photoresist covering the chip surface and remove the photoresist in the unexposed areas.

The specific usage usually includes the following steps:
Preparation: Before developing, you need to prepare the developing equipment and developing solution. The developing solution is usually a special chemical solution that selectively dissolves the photoresist in unexposed areas.
Soaking: The chip covered with photoresist is soaked in a developing solution. The soaking time and temperature usually need to be controlled to ensure that the photoresist is properly removed.
Washing: After development is completed, the chip usually needs to be washed to remove developing solution residue and other impurities.
Drying: Finally, the chip needs to be dried to ensure that its surface is dry and residue-free.

In display panel manufacturing, similar development steps may also be used to remove certain materials or compounds to form specific patterns or structures for the display panel. It is worth noting that the development process requires strict control of processing parameters and time to ensure that the resulting patterns and structures meet design requirements and manufacturing accuracy. In addition, in any manufacturing process, the use of chemical substances requires compliance with corresponding safe operating procedures and environmental protection requirements.

Developers are mainly used in the photolithography process in the semiconductor industry. The photolithography process is a key step in semiconductor manufacturing, used to define tiny patterns and structures on silicon wafers on the chip. In the photolithography process, photoresist is coated on the surface of a silicon wafer, and then the pattern is transferred to the photoresist by using a mask and exposure to UV light. Then, the developer comes on stage. The function of the developer is to dissolve or remove the portion of the photoresist that has not been photolithographed, thereby transferring the desired pattern to the silicon wafer. This step lays the foundation for subsequent etching, deposition and other processes, ensuring that the required microstructure on the chip can be accurately copied to the silicon wafer. The selection and use of the developer has an important impact on the quality and performance of the final chip, so the use of the developer needs to be strictly controlled and standardized in the production of the semiconductor industry.