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Hydrogen Peroxide

Hydrogen peroxide, with the chemical formula H2O2, is a colorless liquid that looks similar to water. It is an oxidant with strong oxidizing and bleaching properties. Hydrogen peroxide is a common chemical that is widely used in many fields.

    Parameter Table

    Application Area Application Area Another Name Product Quality Package

    Industry

    Hydrogen Peroxide

    H2O2

    G5

    TANK, 200L Drum

    Product Description

    Hydrogen Peroxide has wide applications in many fields, including:

    Medical field: Used as a disinfectant and bleach for cleaning wounds and disinfecting medical equipment.

    Hygiene and personal care products: Commonly used in bleaches, mouth rinses and hair dyes.

    Industrial areas: Used as a bleaching agent in the pulp and paper making process, as well as in wastewater treatment and environmental cleaning.

    Food and Beverage Industry: Used as a bleaching agent and disinfectant in food packaging and also for disinfection and bleaching in brewing and food processing.

    Chemical industry: As an oxidant, used in the production of organic peroxides and other chemicals.

    These are just some of the applications of hydrogen peroxide in various industries, and its versatility makes it a very valuable chemical.

    In semiconductor manufacturing processes, hydrogen peroxide is often used as a process chemical for cleaning and residue removal.

    It can be used in the following situations:

    Cleaning: In semiconductor production, hydrogen peroxide can be used to clean silicon wafers and other semiconductor devices to remove organic and inorganic residues oen the surface to ensure surface cleanliness and quality.

    Metal Removal: Hydrogen peroxide can also be used to remove metal residues, such as metal contamination or metal oxides.

    Surface treatment: In some cases, hydrogen peroxide can be used for surface treatment to change the characteristics of semiconductor devices. In general, hydrogen peroxide is commonly used as a cleaning agent and chemical treatment agent in semiconductor manufacturing to ensure the quality and reliability of semiconductor device surfaces.

    When using hydrogen peroxide, it is important to follow safe operating procedures and avoid adverse reactions with other chemicals.

    Hydroperoxides are primarily used as cleaning agents in integrated circuit manufacturing processes. It can be used to clean silicon wafer surfaces to remove organic and inorganic contaminants, ensuring purity and quality during the manufacturing process. Additionally, hydroperoxides can be used to clean metal and glass surfaces, removing deposits and impurities. When using hydroperoxides, concentration and treatment times need to be strictly controlled to avoid adverse effects on sensitive materials and equipment. When using hydroperoxides, safe operating procedures need to be strictly followed to ensure the safety of workers and equipment.

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