Stripper
Parameter Table
| Application Area | Classification | Product Name | Another Name | Product Quality |
| TFT-LCD |
Stripper |
Stripper | Stripper | < 100ppb |
| Dimethyl Sulfoxide | DMSO | < 100ppb | ||
| Monoethanolamine | MEA | < 100ppb |
Product Description
In the manufacturing process of integrated circuits and display panels, "stripper" usually refers to the developer used to remove the unexposed parts of the photoresist. Its usage steps generally include:
Exposure: During the manufacturing process, photoresist is coated on the surface of the silicon wafer. The adhesive layer is then exposed to light with a design pattern. Through the photolithography process, the pattern is transferred to the photoresist.
Development: The unexposed parts need to be removed. In this step, a developer (stripper) is used to remove the photoresist from unexposed areas to create the desired pattern.
Cleaning: Clean the silicon wafer and remove any developer residue that may remain on the surface. During the display panel manufacturing process, similar developers may also be used to remove certain materials or compounds to form specific patterns or structures of the display panel. In all cases, use of developer requires compliance with the manufacturer's instructions and safety recommendations to ensure the safety of workers and the correct use of production equipment.
In the chip manufacturing process, Stripper usually refers to a photoresist stripper, which is used to remove photoresist. Photoresist is a key material used for pattern transfer in chip manufacturing. In the photolithography process, photoresist is coated on the surface of the chip, and then the required pattern is formed through steps such as exposure and development. However, once the pattern transfer is complete, the remaining photoresist on the chip surface needs to be removed in order to proceed with the next process step, such as etching or deposition. At this time, you need to use Stripper to remove the photoresist. Stripper is usually a chemical solution that can quickly and effectively dissolve and remove photoresist without damaging the chip surface. This process is critical to ensuring the accuracy and quality of chip manufacturing. After the photoresist is removed, the chip surface becomes clean, providing a clean surface for subsequent process steps.
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